News & Press

    22.01.2014

    Picosun develops ALD for graphene-based displays and electronics
    ESPOO, Finland, 22nd January, 2014 – Picosun Oy, a leading Atomic Layer Deposition (ALD) equipment manufacturer teams up with several prominent European nanotechnology companies and research institutes to develop novel, ...

    03.12.2013

    Superb business experience into Picosun Board
    ESPOO, Finland, 3rd December, 2013 – Picosun Oy, the leading Atomic Layer Deposition (ALD) equipment manufacturer, has elected a new Board of Directors in the company’s General Shareholders’ Meeting.

    18.11.2013

    Picosun’s fast P-200 batch ALD tool breaks through into LEDs and MEMS
    ESPOO, Finland, 18th November, 2013 – Picosun Oy, the leading Atomic Layer Deposition (ALD) equipment manufacturer, announces the launch of the new PICOSUN™ P-200 batch ALD system. The P-200 ALD tool is specifically ...

    25.10.2013

    Picosun brings ALD into pacemakers and electric cars
    ESPOO, Finland, 25th October, 2013 – Picosun Oy, the leading Atomic Layer Deposition (ALD) equipment manufacturer, provides novel batch ALD processes for fast, cost-efficient mass production of next generation 3D ...

    20.09.2013

    Picosun receives a significant capital investment
    ESPOO, Finland, 20th September, 2013 – Finnish, leading Atomic Layer Deposition (ALD) equipment manufacturer Picosun Oy receives a 5.4 million euro capital investment from Finnish investors. The investor group consists ...

    30.08.2013

    Picosun's ALD technology protects coins
    ESPOO, Finland, 30th August, 2013 – Picosun Oy, the leading Atomic Layer Deposition (ALD) equipment manufacturer, reports breakthrough into coinage and minting market. This new application for Picosun’s technology ...

    16.07.2013

    Picosun’s P-1000 large scale batch ALD reactor expands the limits of ALD manufacturing
    ESPOO, Finland, 16th July, 2013 – Picosun Oy, a leading Atomic Layer Deposition (ALD) equipment manufacturer, presents PICOSUN™ P-1000 ultra-large scale batch ALD tool – the latest addition to the fully automated, high ...

    10.06.2013

    Top quality Cu diffusion barriers from Picosun in the ENIAC JU project ESiP
    ESPOO, Finland, 10th June, 2013 – Picosun Oy, leading Atomic Layer Deposition (ALD) equipment manufacturer, reports excellent process results for copper diffusion barrier deposition. ALD materials for copper diffusion ...

    09.04.2013

    Picosun’s high performance 300-mm ALD cluster tool enters new generation memory market
    ESPOO, Finland, 9th April, 2013 – Picosun Oy, leading Atomic Layer Deposition (ALD) equipment manufacturer, reports that its PICOPLATFORM™ 300 ALD cluster tool has been selected by a key customer in Asia for new memory ...

    05.03.2013

    Picosun presents continuous ALD for moisture and oxygen barriers
    ESPOO, Finland, 5th March, 2013 – Picosun Oy, leading Atomic Layer Deposition (ALD) equipment manufacturer, and VTT Technical Research Centre of Finland report notable progress in continuous ALD technology. The water ...

    28.01.2013

    Picosun ALD fills the gap in MEMS devices
    ESPOO, Finland, 28th January, 2013 – Picosun Oy, leading Atomic Layer Deposition (ALD) equipment manufacturer expands its central role in the field of European semiconductor manufacturing by taking part in a yet new ...

    19.12.2012

    Picosun launches new Picofloat™ particle coating system
    ESPOO, Finland, 19th December, 2012 – Picosun Oy, leading atomic layer deposition (ALD) equipment manufacturer announces the launch of new Picofloat™ particle coating system. The new design will further complement ...